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High Power Impulse Magnetron Sputtering

HIPIMS stands for High Power Impulse Magnetron Sputtering. This relatively recent advance in pulsed sputtering uses very high power, short duration pulses of power to both generate a plasma and ionize a large percentage of the sputtered atoms. These ionized atoms have much higher energies than sputtered atoms in conventional magnetron sputtering and have been found to yield very dense and stable films.

Currently, this technique has been used principally for wear resistant coatings (tribological) and recent work has extended this technique to the field of optical coatings.

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