Physical Vapour Deposition (PVD) is a deposition technique that is used to coat materials in order to improve its hardness, oxidation resistance, and wear resistance. A material can be coated to very minimal thicknesses ranging from nanometers to micrometers using PVD which is more than enough to increase its lifetime.
Fundamentals of PVD
PVD can be achieved through various methods such as Cathodic Arc Deposition, Electron Beam-PVD, Evaporative Deposition, Pulsed Laser Deposition, and Sputter Deposition. Though these methods may differ from each other at certain steps, they all follow some of the basic fundamentals of PVD that includes:
1. Vaporization of a material from condensed phase at a high temperature in vacuum.
2. Transportation of the vapour to the substrate surface.
3. Deposition onto the substrate surface by condensation.